Surface roughening in low-pressure chemical vapor deposition
نویسندگان
چکیده
We examine, using (211)-dimensional Monte Carlo simulations, the roughening behavior of a reemission model for chemical vapor deposition. We find that, for pure first-order reemission, the interface roughens logarithmically with time and that the scaling exponents are, for most sets of conditions, close to the exponents of the Edwards-Wilkinson model (a50, b50, and z52). We compare our results to experimental results on chemical vapor deposition.
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تاریخ انتشار 2001